Total Cross Sections for Electron Scattering from $CF_4$, $C_2F_4$, $C_2F_6$, $C_3F_8$ in the Energy Range from 100 eV to 5000 eV

Authors

  • Xiaoming Tan School of Physics and Optoelectronic Engineering, Ludong University, Yantai 264025, China
  • Mingliang Liu School of Physics and Optoelectronic Engineering, Ludong University, Yantai 264025, China

DOI:

https://doi.org/10.4208/jams.041115.050915a

Keywords:

total cross section, electron scattering, the revised additivity rule.

Abstract

The additivity rule for electron scattering from molecule has been revised by considering the difference between the free atom and the corresponding bound atom in the molecule. The total cross sections for electron scattering from plasma etching molecules $CF_4,$ $C_2F_4,$ $C_2F_6$ and $C_3F_8$ have been calculated in the energy range from 100 eV to 5000 eV with the revised additivity rule. The present calculations are compared with the original additivity rule results and the existing experimental data. A better agreement between the present results and the experimental data is obtained.

Published

2015-06-01

Issue

Section

Articles